Anisotropic wet etching of a novel micro-texture structure for an Al/n-Si/Al metal�semiconductor�metal photodetector fabrication

dc.contributor.authorKamonwan Suttijalern
dc.contributor.authorSurasak Niemcharoen
dc.date.accessioned2025-07-21T06:05:25Z
dc.date.issued2021-06-24
dc.identifier.doi10.1088/1361-6439/ac0e7e
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/10449
dc.subjectTexture (cosmology)
dc.subject.classificationOptical Coatings and Gratings
dc.titleAnisotropic wet etching of a novel micro-texture structure for an Al/n-Si/Al metal�semiconductor�metal photodetector fabrication
dc.typeArticle

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