Development of Nanohole Array Patterned by Laser Interference Lithography Technique

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dc.contributor.authorN. Srisuai
dc.contributor.authorMati Horprathum
dc.contributor.authorP. Eiamchai
dc.contributor.authorP. Chindaudom
dc.contributor.authorS. Boonruang
dc.contributor.authorSomyod Denchitcharoen
dc.date.accessioned2025-07-21T05:56:36Z
dc.date.issued2016-01-01
dc.identifier.doi10.4028/www.scientific.net/kem.675-676.41
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/5562
dc.subjectPhotoresist
dc.subjectNanosphere lithography
dc.subject.classificationNanofabrication and Lithography Techniques
dc.titleDevelopment of Nanohole Array Patterned by Laser Interference Lithography Technique
dc.typeArticle

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