Simultaneous stoichiometric composition and highly (00l) orientation of flexible Bi2Te3thin films via optimising the DC magnetron sputter-deposition process

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dc.contributor.authorNuttakrit Somdock
dc.contributor.authorSupasak Kianwimol
dc.contributor.authorAdul Harnwunggmoung
dc.contributor.authorAparporn Sakulkalavek
dc.contributor.authorRachsak Sakdanuphab
dc.date.accessioned2025-07-21T06:00:30Z
dc.date.issued2018-09-21
dc.identifier.doi10.1016/j.jallcom.2018.09.216
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/7765
dc.subjectStoichiometry
dc.subjectSpark Plasma Sintering
dc.subjectCavity magnetron
dc.subjectDeposition
dc.subjectElectron Mobility
dc.subject.classificationAdvanced Thermoelectric Materials and Devices
dc.titleSimultaneous stoichiometric composition and highly (00l) orientation of flexible Bi2Te3thin films via optimising the DC magnetron sputter-deposition process
dc.typeArticle

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