A Pure CMOS Stack Electrostatic Micromirror Featuring Simplified Fabrication and Stress-Adjusted Modeling

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dc.contributor.authorWenhao Chen
dc.contributor.authorHadi Tavakkoli
dc.contributor.authorBin Zhao
dc.contributor.authorMaojie Zhang
dc.contributor.authorWibool Piyawattanametha
dc.contributor.authorYi-Kuen Lee
dc.date.accessioned2025-07-21T06:12:34Z
dc.date.issued2025-01-19
dc.identifier.doi10.1109/mems61431.2025.10917994
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/14222
dc.subject.classificationAdvanced MEMS and NEMS Technologies
dc.titleA Pure CMOS Stack Electrostatic Micromirror Featuring Simplified Fabrication and Stress-Adjusted Modeling
dc.typeArticle

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