Physical Properties of Copper Films Deposited by Compact-Size Magnetron Sputtering Source with Changing Magnetic Field Strength

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dc.contributor.authorNathaporn Promros
dc.contributor.authorPhongsaphak Sittimart
dc.contributor.authorNattatip Patanoo
dc.contributor.authorSukrit Kongnithichalerm
dc.contributor.authorMati Horprathum
dc.contributor.authorWorawan Bhathumnavin
dc.contributor.authorBoonchoat Paosawatyanyong
dc.date.accessioned2025-07-21T05:56:43Z
dc.date.issued2016-01-01
dc.identifier.doi10.4028/www.scientific.net/kem.675-676.193
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/5604
dc.subjectCavity magnetron
dc.subject.classificationMetal and Thin Film Mechanics
dc.titlePhysical Properties of Copper Films Deposited by Compact-Size Magnetron Sputtering Source with Changing Magnetic Field Strength
dc.typeArticle

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