Oxygen Control on Nanocrystal-AlON Films by Reactive Gas-Timing Technique R.F. Magnetron Sputtering and Annealing Effect

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dc.contributor.authorWin Bunjongpru
dc.contributor.authorS. Porntheeraphat
dc.contributor.authorN. Somwang
dc.contributor.authorP. Khomdet
dc.contributor.authorC. Hruanun
dc.contributor.authorAmporn Poyai
dc.contributor.authorJ. Nukeaw
dc.date.accessioned2025-07-21T05:49:55Z
dc.date.issued2008-08-01
dc.identifier.doi10.4028/www.scientific.net/amr.55-57.573
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/1734
dc.subjectCavity magnetron
dc.subjectAuger electron spectroscopy
dc.subject.classificationAcoustic Wave Resonator Technologies
dc.titleOxygen Control on Nanocrystal-AlON Films by Reactive Gas-Timing Technique R.F. Magnetron Sputtering and Annealing Effect
dc.typeArticle

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