Growth and Characterization of Zinc Oxynitride Thin Films by Reactive Gas-Timing RF Magnetron Sputtering

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dc.contributor.authorDon Klaitabtim
dc.contributor.authorSirapat Pratontep
dc.contributor.authorJiti Nukeaw
dc.date.accessioned2025-07-21T05:49:32Z
dc.date.issued2008-01-01
dc.identifier.doi10.1143/jjap.47.653
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/1515
dc.subjectCavity magnetron
dc.subject.classificationZnO doping and properties
dc.titleGrowth and Characterization of Zinc Oxynitride Thin Films by Reactive Gas-Timing RF Magnetron Sputtering
dc.typeArticle

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