Wettability, Surface Morphology and Structural Properties of _-FeSi2 Films Manufactured Through Usage of Radio-Frequency Magnetron Sputtering - Peerasil Charoenyuenyao; Nathaporn Promros; Rawiwan Chaleawpong; Nattakorn Borwornpornmetee; Pattarapol Sittisart; Y_ki Tanaka; Tsuyoshi Yoshitake (My University, 2020)
Keywords: Morphology; Semiconductor materials and interfaces