Effect of Exposure Energy, Focus Range, and Surface Reflection on the Photolithography Process of Contact Hole Patterning - R. Sonboonton; E. Chaowicharat; P. Meesapawong; J. Ladthidej; W. Titiroongruang; C. Hruanun (My University, 2008)
Keywords: Photoresist; Chemical Mechanical Planarization; Undercut; Microelectronics; Advanced Surface Polishing Techniques