Effect of Operated Pressure on Anticorrosive Behavior of Ta2O5 Thin Film Grown by D.C. Reactive Magnetron Sputtering System - Narathon Khemasiri; Chanunthorn Chananonnawathorn; Mati Horprathum; Yossawat Rayanasukha; Darinee Phromyothin; Win Bunjongpru; Supanit Porntheeraphat; Jiti Nukeaw (My University, 2013)
Keywords: Ellipsometry; Cavity magnetron; Semiconductor materials and devices