Khlayboonme, S.Tipawan

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Khlayboonme, S.Tipawan
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Khlayboonme, S. Tipawan
Khlayboonme, S. T.
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s.tipawan.kh@kmitl.ac.th

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    Item type:Publication,
    RF-sputtered V2O5 thin films on two different glass substrates
    (2021-01-01)
    Khlayboonme, S. Tipawan
    ;
    Thowladda, Warawoot
    Thin V<inf>2</inf>O<inf>5</inf> films were deposited on two different commercial soda-lime glass substrates (A and B) by O<inf>2</inf> reactive radio frequency magnetron sputtering using a vanadium target. The influences of the surface energy and roughness of the substrates on the structure and atomic bonding of the films were examined. The film on substrate A was polycrystalline, with eight crystal orientations, whereas the film on substrate B yielded an intense (001) diffraction peak of α-V<inf>2</inf>O<inf>5</inf> and a weak (200) peak of β-V<inf>2</inf>O<inf>5</inf>, indicating preferred orientation along these planes. Structural analyses indicated that substrate B with lower surface energy and higher roughness enhanced the formation of a layered a-V<inf>2</inf>O<inf>5</inf> structure.