Nukeaw, Jiti

Loading...
Thumbnail Image
Preferred name
Nukeaw, Jiti
Alternative Name
Nukeaw, J.
Nukeaw, Jitti
Nukeaw, Jiji
Main Affiliation
Email
jiti.nu@kmitl.ac.th

Settings

Now showing 1 - 1 of 1
  • Loading...
    Thumbnail Image
    Some of the metrics are blocked by your 
    consent settings
    Item type:Publication,
    High-dielectric constant AlON prepared by RF gas-timing sputtering for high capacitance density
    (2008-10-01)
    Poyai, A.
    ;
    Bunjongpru, W.
    ;
    Klunngien, N.
    ;
    Porntheerapat, S.
    ;
    Hruanan, C.
    This paper presents the method to prepare and characterize high-dielectric constant aluminum oxynitride (AlON) formed by RF gas-timing sputtering. AlON layers of 725 nm have been prepared on metal-dielectric-metal structure with substrate temperature below 100 °C. Capacitance versus bias voltage has been measured. The dielectric constant of AlON has been calculated from the slope of the plot of capacitance versus capacitor area. The value of 11 has been obtained from this study. This depends on the composition of the AlON material, which is analyzed by Auger electron spectroscopy. © 2008 Elsevier Ltd. All rights reserved.