Nukeaw, Jiti

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Nukeaw, Jiti
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Nukeaw, J.
Nukeaw, Jitti
Nukeaw, Jiji
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jiti.nu@kmitl.ac.th

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    The effects of substrate temperature on optical properties and surface morphology of nickel phthalocyanine thin films grown by organic evaporator system
    (2008-01-01)
    Inchidjuy, P.
    ;
    Pukird, S.
    ;
    Nukeaw, J.
    Thin films of Nickel Phthalocyanine (NiPc) are prepared at a base pressure of 10<sup>-6</sup> mbar using Organic Evaporator System. The films are deposited onto the glass substrate at various temperatures of 100 °C, 120 °C, 140 °C and 160 °C. Crystalline of NiPc thin films was investigated by X-ray diffraction (XRD) spectroscopy. XRD patterns exhibit to become aggravated crystalline films as monoclinic structure. Surface morphology of NiPc thin films was characterized by field emission scanning electron microscope (FE-SEM). FE-SEM micrographs indicate that fiber-like morphology of NiPc is enhanced with increasing substrate temperature. The optical absorption spectra of these thin films are measured. Present studies reveal that the Q-band of NiPc thin films appears as the change of electron energy level. Absorption spectra obtained from UV-vis of deposited NiPc are declined as the substrate temperature is risen. © 2008 Trans Tech Publications, Switzerland.
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    Surface morphology and structural investigation of TiN nanocrystal thin films grown with different N2 concentration
    (2013-02-19)
    Jiramongkolsiri, Udom
    ;
    Thanomngam, Pitiporn
    ;
    Pankiew, Apilak
    ;
    Porntheerapat, Supanit
    ;
    Nukeaw, Jiti
    In this work, new information on surface morphology, phase and local structure of titanium nitride (TiN) nanocrystal thin films grown with different nitrogen gas concentration by direct current (DC) magnetron sputtering is provided. Surface morphology of the thin films was studied by field emission scanning electron microscope (FE-SEM). Phase and local structure of the TiN nanocrystals were determined by X-ray diffraction spectroscopy (XRD) and X-ray absorption fine structure (XAFS). The TiN nanocrystals were prepared on silicon substrates. N<inf>2</inf>/Ar gases were used as reactive gases for sputtering Ti target. The amount of these two reactive gases was varied at different ratios (N<inf>2</inf>/Ar), i.e. 100:0, 75:25, 50:50 and 25:75 respectively. Our results suggested that sputtering Ti target with high N<inf>2</inf>/Ar gas ratio (higher than 75%) provides good TiN layer while sputtering with low N<inf>2</inf>/Ar gas ratio (lower than 25%) gives Ti layer instead of TiN. In addition, sputtering with 50% N<inf>2</inf>/Ar gas ratio gives a multiphase system between TiN and Ti. Local structure parameters of these nanocrystal thin films are reported. © (2013) Trans Tech Publications, Switzerland.
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    Surface morphology and optical property of silver nanoparticle thin film prepared by electrostatic spray deposition
    (2010-02-05)
    Boonnuk, Y.
    ;
    Chanhom, A.
    ;
    Tunhoo, B.
    ;
    Thiwawong, T.
    ;
    Nukeaw, J.
    Silver nanoparticle thin films were deposited on glass substrates by electrostatics spray deposition. Electrostatic spray condition was optimized by varying distance between nozzle and substrate between 20 mm and 60 mm, deposition time was fixed at 5 minute. The surface morphology and optical properties of films were carried out by using Atomic Force Microscope (AFM), Field Emission Scanning Electron Microscopy (FE-SEM) and UV-Vis Spectrophotometer. The results is indicate that the surface morphology of silver nanoparticle thin film show the grain size of film near around 100 nm at distance between nozzle and substrate of 60 mm and the RMS roughness decreases from 9.59 nm to 2.35 nm when distance between nozzle and substrate was increased from 20 mm to 60 mm. The optical absorption spectra showed the main absorption peak at 436 nm. When the distance between the nozzle and the substrate raise, decrease in absorption has been observed. © (2010) Trans Tech Publications.