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Effect of thickness on GLAD TiO2 thin films with incline spinning substrate on rotating holder (ISSRH) technique
Author(s)
Date Issued
June 6, 2011
Type
Conference Paper
Abstract
The report presents the effects of the thickness on the TiO2 thin films prepared by the GLAD technique with incline spinning substrate on rotating holder (ISSRH) by using the electron beam evaporation. The prepared films were heated at 500 °C for 2 hr in air. The microstructure of films was investigated by UV- visible photometer, X-ray diffraction, XRD and field emission scanning electron microscope, FE-SEM. The results showed the thickness of 10, 50, 100 and 300 nm films exhibited continuity distribution of the crystalline. The crystalline structure evidenced the dominant peak at the 300 nm thickness. GLAD TiO2 films exhibited the columnar growth and porosity. The TiO2 nanostructures showed rutile phase. © (2011) Trans Tech Publications.
Citation
Advanced Materials Research, 236-238, 3024-3027, 2011