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Implementation of the temperature and narrow channel dependence on threshold voltage model of NMOSFETs

Author(s)
Ruangphanit, A.
Sakuna, N.
Niemcharoen
Phinyo, B.
Muanghlua, R.
Date Issued
January 1, 2014
Type
Conference Paper
DOI
10.1109/JICTEE.2014.6804064
Abstract
In this paper, a new simplify mismatch of temperature and narrow channel dependence of threshold voltage of NMOS developed from spice level 3 and BSIM3 are proposed. The IDS-VGS in linear region was used with a different channel width. The parameters extraction procedure is based on the measurement of the transconductance characteristics of MOSFET in linear region. In this model, the temperature coefficient for threshold voltage and the body-bias coefficient of threshold voltage of a big MOSFET and a narrow channel width of MOSFET are determined. The results show that, the deviation of threshold voltage from the predicted model compared with the experimental data is less than 5%. © 2014 IEEE.
Citation
Jictee 2014 4th Joint International Conference on Information and Communication Technology Electronic and Electrical Engineering, 2014
Subjects

BSIM3

MOSFETs

NMOS

Metrics
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