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Effect of substrate depth to 5-contact vertical hall

Author(s)
Poonsawat, Sawatdipong
Phetchakul, Toempong
Poyai, Amporn
Date Issued
November 3, 2017
Type
Conference Paper
DOI
10.1109/ECTICon.2017.8096314
Abstract
We studied the flve-contact vertical Hall device using TCAD at various depth of substrate. Two main mechanisms of Hall voltage are induced voltage from Lorentz's force and differential current. At low depth, the percentage of voltage from Lorentz's force is much greater than the voltage from differential current. The depth does not only affect Hall voltage by Lorentz's force but also affect contact differential current. The Hall voltage and sensitivity of device are increased with substrate depth until the critical value. The sensitivity of device is saturation when the substrate depth is more than 70 μm. The output voltage from differential current is 45% of overall output voltage at saturation condition.
Citation
Ecti Con 2017 2017 14th International Conference on Electrical Engineering Electronics Computer Telecommunications and Information Technology, 620-623, 2017
Subjects

5 contacts

diffential current

parallel magnetic fie...

TCAD

vertical Hall

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