Low resistance bisphenol-A based polybenzoxazine derived laser-induced graphene (LIG) and its microsupercapacitor application

Abstract

Herein, we demonstrate the use of conventional BA-a based polybenzoxazine as a laser-induced graphene (LIG) forming precursor. The effects of laser power and the engraving speed on formation and properties of LIG are explored. By optimizing the laser fluency related to laser power along with engraving speed, poly(BA-a) derived LIG with high graphitization degree and low sheet resistance (Rs) of ∼ 2–10 Ω/sq can be acquired. The morphologies and surface area of LIGs in such low Rs region are then validated through SEM and BET, respectively. The resulting poly(BA-a) derived LIG exhibits a high amount of macropores in the structure with marginal differences in the specific surface area being 27–88 m2/g. In addition, electrochemical performances of the two-electrode based microsupercapacitor (LIG-MSC) of the selected samples in low Rs region with different specific surface area are evaluated. The LIG-MSC shows a specific capacitance of 1.39 mF/cm2 (0.04 mA/cm2), and good cycling stability of 10,000 cycles with capacitance retention of 92% (0.2 mA/cm2). Our results highlight that poly(BA-a) derived LIG is promising for high performance LIG applications.