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Electrical bistable properties of copper phthalocyanine at different deposition rates

Author(s)
Onlaor, K.
Tunhoo, B.
Keeratithiwakorn, P.
Thiwawong, T.
Nukeaw, J.
Date Issued
June 1, 2012
Type
Article
DOI
10.1016/j.sse.2012.01.003
Abstract
Organic bistable memory device is a next-generation of the electrical memory unit. In this paper, we report about the influence of structural properties on electrical bistable behavior of copper phthalocyanine organic memory device. Copper phthalocyanine (CuPc) layer was prepared by thermal evaporation technique at different deposition rates. When the deposition rate is increased, the film crystalline decreases and the surface morphology gradually changes from large flat grain to fine grain structure. Structural parameters such as the crystalline size of CuPc films and dislocation density can be calculated from XRD spectra. Moreover, the effect of deposition rate of CuPC layer on the bistable properties can be performed by current-voltage characteristics, retention measurement, impedance spectroscopy and temperature dependence measurement. The conduction mechanism in both ON and OFF states of the bistable device was analyzed by theoretical model, which can be proposed as a possible trap center of the carrier trapping and de-trapping process by structural defects in CuPc layer. Furthermore, the reliability issue such as cycling endurance and data retention is presented. © 2012 Elsevier Ltd. All rights reserved.
Citation
Solid State Electronics, 72, 60-66, 2012
Subjects

Conduction mechanism

CuPc

Memory device

Organic memory

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