Silicon Nitride Thin Films Deposited By Reactive Gas-timing Magnetron Sputtering For Protective Coating Applications

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dc.contributor.authorN. Khemasiri
dc.contributor.authorN. Paleeya
dc.contributor.authorD. Sae-tang Phromyothin
dc.contributor.authorM. Horprathum
dc.contributor.authorA. Sungthong
dc.contributor.authorJ. Nukeaw
dc.contributor.authorS. Pratontep
dc.date.accessioned2025-07-21T05:55:54Z
dc.date.issued2015-06-01
dc.identifier.doi10.5185/amlett.2015.sms5
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/5169
dc.subjectAuger electron spectroscopy
dc.subject.classificationDiamond and Carbon-based Materials Research
dc.titleSilicon Nitride Thin Films Deposited By Reactive Gas-timing Magnetron Sputtering For Protective Coating Applications
dc.typeArticle

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