Fabrication of MEMS-based capacitive silicon microphone structure with staircase contour cavity using multi-film thickness mask

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dc.contributor.authorJirawat Jantawong
dc.contributor.authorNithi Atthi
dc.contributor.authorChana Leepattarapongpan
dc.contributor.authorAwirut Srisuwan
dc.contributor.authorWutthinan Jeamsaksiri
dc.contributor.authorKathirgamasundaram Sooriakumar
dc.contributor.authorAnu Austin
dc.contributor.authorSurasak Niemcharoen
dc.date.accessioned2025-07-21T06:00:54Z
dc.date.issued2018-12-31
dc.identifier.doi10.1016/j.mee.2018.12.004
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/7997
dc.subjectArray data structure
dc.subject.classificationAdvanced MEMS and NEMS Technologies
dc.titleFabrication of MEMS-based capacitive silicon microphone structure with staircase contour cavity using multi-film thickness mask
dc.typeArticle

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