Nukeaw, Jiti

Preferred name

Nukeaw, Jiti

Alternative Name

Nukeaw, J.

Nukeaw, Jitti

Nukeaw, Jiji

Main Affiliation

Integrated Innovative Technology

jiti.nu@kmitl.ac.th

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Optical band engineering of metal-oxynitride based on tantalum oxide thin film fabricated via reactive gas-timing RF magnetron sputtering
(2016-11-25)
Khemasiri, N.
;
Jessadaluk, S.
;
Chananonnawathorn, C.
;
Vuttivong, S.
;
Lertvanithphol, T.
In this paper, we demonstrate a novel technique, as called reactive gas-timing (RGT) RF magnetron sputtering, to control and design an optical band engineering of TaON thin films without an external heating substrate temperature and post annealing treatment process. The influence of the oxygen intervals ranged from 5 to 60 s on deposition rate, chemical composition and optical properties of TaON thin films were investigated. The chemical composition was characterized by auger electron spectroscopy (AES). The optical properties were determined by UV–Vis spectrophotometer and spectroscopic ellipsometry. The nitrogen atomic concentration of the TaON thin films deposited by RGT decreased when the oxygen gas-timing intervals increased. In addition, the RGT sputtered TaON films could be demonstrated band gaps engineering from 1.90 to 2.15 eV.
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Phase formation polycrystalline vanadium oxide via thermal annealing process under controlled nitrogen pressure
(2017-10-20)
Jessadaluk, S.
;
Khemasiri, N.
;
Rahong, S.
;
Rangkasikorn, A.
;
Kayunkid, N.
This article provides an approach to improve and control crystal phases of the sputtering vanadium oxide (V<inf>x</inf>O<inf>y</inf>) thin films by post-thermal annealing process. Usually, as-deposited V<inf>x</inf>O<inf>y</inf> thin films at room temperature are amorphous phase: post-thermal annealing processes (400 °C, 2 hrs) under the various nitrogen (N<inf>2</inf>) pressures are applied to improve and control the crystal phase of V<inf>x</inf>O<inf>y</inf> thin films. The crystallinity of V<inf>x</inf>O<inf>y</inf> thin films changes from amorphous to α-V<inf>2</inf>O<inf>5</inf> phase or V<inf>9</inf>O<inf>17</inf> polycrystalline, which depend on the pressure of N<inf>2</inf> carrier during annealing process. Moreover, the electrical resistivity of the V<inf>x</inf>O<inf>y</inf> thin films decrease from 105 Ω cm (amorphous) to 6×10-1 Ω cm (V<inf>9</inf>O<inf>17</inf>). Base on the results, our study show a simply method to improve and control phase formation of V<inf>x</inf>O<inf>y</inf> thin films<inf>.</inf>
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Observations of the initial stages on reactive gas-timing sputtered TaO thin films by dynamic in situ spectroscopic ellipsometery
(2019-06-01)
Chittinan, D.
;
Buranasiri, P.
;
Lertvanithphol, T.
;
Eiamchai, P.
;
Patthanasettakul, V.
Dynamic in-situ spectroscopic ellipsometry (iSE) was employed to investigate the growth mechanism of the tantalum oxide (TaO) film on silicon wafer substrate deposited by reactive gas-timing RF magnetron sputtering compared with conventional reactive sputtering. The effect of reactive gas timing parameter on physical structure and optical property were analyzed by both the continuous and island film growth model with Tauc-Lorentz optical model. The variation of refractive index, film thickness and void volume fraction were obtained from dynamic fits of iSE data indicated that the growth process of the amorphous TaO thin films was divided into two regimes: the nucleation stage and continuous-layer stage. These stages were observed during deposition although the initial film growth stage corresponds to the island film growth model. The study demonstrates that sputtered TaO by the RGT technique at the O<inf>2</inf> on-off gas timing has played a crucial factor in improving the formation of nucleation stage and that the deposited TaO thin films were high deposition rate with high refractive index. The complementary field emission scanning electron microscope (FE-SEM) and transmission electron microscope (TEM) showed a good agreement with the film thickness and morphology obtained from dynamic iSE measurement. The real-time monitoring of iSE offers important evidences to understand the growth mechanism of reactive gas-timing technique.
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Spectroscopic study on amorphous tantalum oxynitride thin films prepared by reactive gas-timing RF magnetron sputtering
(2019-10-30)
Lertvanithphol, T.
;
Rakreungdet, W.
;
Chananonnawathorn, C.
;
Eiamchai, P.
;
Limwichean, S.
The amorphous tantalum oxynitride (TaO<inf>x</inf>N<inf>y</inf>) thin films were prepared on silicon (100) substrates by magnetron sputtering system with different techniques of conventional reactive sputtering and reactive gas-timing (RGT). The films were studied via spectroscopic ellipsometry (SE) measured in the range of 0.75–5.0 eV with 0.025 eV interval at 70° incident angle, and the optical model based on Tauc-Lorentz function was constructed to extract the properties of the films. The SE results indicated that all prepared films were grown homogeneously and show different optical properties upon their deposition conditions and techniques. The optical properties of film prepared by conventional reactive sputtering were close to the tantalum oxide film (TaO). The refractive index and optical band gap (E<inf>g</inf>) of RGT samples changed with the oxygen timing and correlated with the change of oxygen and nitrogen concentration of the films. In addition, the morphologies, crystallinities, atomic concentrations and distributions of nitrogen atoms in the films analyzed by field-emission scanning electron microscopy, glazing-incident X-ray diffraction, X-ray photoelectron spectroscopy and X-ray absorption spectroscopy are also discussed.
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Control the crystal growth of Al-doped ZnO thin film prepared by pulsed laser deposition and the influences on its optical and electrical properties
(2017-10-20)
Khemasiri, N.
;
Jessadaluk, S.
;
Kayunkid, N.
;
Rahong, S.
;
Rangkasikorn, A.
In this work, highly transparent and highly conductive thin films of Al-doped ZnO (AZO) are achieved by pulsed laser deposition (PLD). By changing substrate temperature in the range of room temperature to 500°C during the deposition process, the preferential growth direction of AZO crystal is controlled and, therefore, the surface morphology, optical and electrical properties of AZO thin films are able to be manipulated. X-ray diffractograms as a function of the substrate temperature clearly illustrate the ability to control the preferential growth direction of AZO. At the low substrate temperature, the growth along [002] direction corresponding to c-axis of hexagonal ZnO is only observed. By elevating the substrate temperature, not only crystallinity of AZO thin film is further improved but also the competition of crystal growth along the [002], [001] and [101] directions are occurred due to the increase of total energy and surface mobility of cluster/atom. The AZO films obtained by all preparation conditions exhibit an n-type semiconducting characteristics, furthermore, the carrier concentration and the carrier mobility of AZO thin films can be optimized to reach 4.10×1020 cm-3 and 7.53 cm2/Vs, respectively. The excellences in both carrier concentration and mobility of AZO thin film lead to very low resistivity of 2.08×10-3 cm. In addition, the wide optical band gap of ∼3.50 eV together with the high transparency over 90% in visible region is obtained from the AZO thin films. The exceptional optical and electrical properties of AZO thin film demonstrate that such material has enough potential to become a promising candidate using in optoelectronic applications.

Nukeaw, Jiti

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