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Effect of Operated Pressure on Anticorrosive Behavior of Ta<sub>2</sub>O<sub>5</sub> Thin Film Grown by D.C. Reactive Magnetron Sputtering System
Effect of Operated Pressure on Anticorrosive Behavior of Ta<sub>2</sub>O<sub>5</sub> Thin Film Grown by D.C. Reactive Magnetron Sputtering System
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Date
2013-09-01
Authors
Narathon Khemasiri
Chanunthorn Chananonnawathorn
Mati Horprathum
Yossawat Rayanasukha
Darinee Phromyothin
Win Bunjongpru
Supanit Porntheeraphat
Jiti Nukeaw
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Ellipsometry
,
Cavity magnetron
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https://dspace.kmitl.ac.th/handle/123456789/4141
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